An'am, Rafi Miftachul and , Ir. Agung Setyo Darmawan, S.T., M.T., IPM (2024) Pembentukan Lapisan Tipis Tungsten Nitrida Dengan Sputtering Pada Permukaan Baja Tahan Karat Aisi 410 Hasil Anil Untuk Meningkatkan Ketahanan AUS. Skripsi thesis, Universitas Muhammadiyah Surakarta.
![[img]](https://eprints.ums.ac.id/style/images/fileicons/application_pdf.png) |
PDF (Naskah Publikasi)
Naskah Publikasi-D200200100-Rafi Miftachul An'am.pdf Restricted to Repository staff only Download (1MB) |
|
PDF (Surat Pernyataan Publikasi)
Surat Pernyataan Publikasi - Rafi publis_001.pdf Restricted to Repository staff only Download (286kB) |
Abstract
The sputtering process is one of the PVD (Physical Vapor Deposition) methods which has been proven to increase the wear resistance of metals. This research aims to determine the effect of variations in plasma sputtering process time on the thickness and wear resistance of the Tungsten Nitride (WN) thin layer on annealed AISI 410 stainless steel. The thin layer formation technique used is the plasma sputtering process using a Tungsten (W) target and the reactive gas is Nitrogen (N) to form a Tungsten Nitride (WN) layer, with time variations of 30 minutes, 60 minutes, 90 minutes and 120 minutes. From the SEM-EDS test results with the ASTM E986 standard, it was found that the average layer thickness increased with each increase in time variation from 0.38881 µm to 1.44 µm. The results of wear resistance testing using the ASTM G99-04 standard showed a decrease in the specific wear value for samples resulting from the annealing process of 0.000167719 mm2/kg to samples resulting from annealing and sputtering processes lasting 120 minutes amounting to 0.000079871 mm2/kg. So it can be concluded that the longer the sputtering process, the thickness of the thin layer will increase, and the specific wear value will decrease or in other words the wear resistance will become better
| Item Type: | Thesis (Skripsi) |
|---|---|
| Uncontrolled Keywords: | AISI 410, Annealing, Wear Resistance, Plasma Sputtering WN, SEM-EDS (Scanning Electron Microscope – Energy Dispersive X-Ray Spectroscopy). |
| Subjects: | T Technology > TJ Mechanical engineering and machinery |
| Divisions: | Fakultas Teknik > Teknik Mesin |
| Depositing User: | RAFI MIFTACHUL AN'AM |
| Date Deposited: | 29 Jul 2024 02:51 |
| Last Modified: | 29 Jul 2024 02:51 |
| URI: | http://eprints.ums.ac.id/id/eprint/125056 |
Actions (login required)
 |
View Item |
